Magnetron sputtering systems with special drum design for small substrates
Our box coater concept
Single-chamber sputtering systems are an inexpensive solution for vacuum coating in small series production. Our FHR.Boxx series sputtering systems, also called "box coaters", dispense with the need for a load lock chamber; the substrate is usually loaded directly with the process chamber open. A rotating drum acts as a substrate carrier in the recipient, which can also optionally be used for heating the mostly small-surface substrates. The substrates to be coated can be led past several process stations by rotating the drum during the vacuum process. It is even possible to coat 3D substrates such as eyeglass frames by incorporating a sub-rotation. The process achieves a good uniform layer thickness overall. Substrate pre-treatment is also possible, for example, by means of plasma etching.
You can combine these process technologies
The following technologies can be implemented into our in-line systems in accordance to the specific requirements of the customers' applications.
- Magnetron sputtering
- Plasma Etching (PE)
A quick look at the advantages for you
The FHR.Boxx product family provides our customers with high-quality coating machines that combine a wide variety of characteristics and advantages.
- Multiple coating and pre-cleaning stations
- Coating of layers stacks is possible
- Optional load lock
- Substrate sub-rotation
- Substrate heating
- Particles and flaking are minimized thanks to the special construction
- Easy maintenance because the components are easily accessible
- Attractive investment and operating costs
- Use of FHR's proprietary sputtering technology