FHR.Star product series

Process systems for deposition, removal and modification of thin layers on wafer-type substrates in small scale, pilot production or in research and development

  • Based on a flexible modular concept   
  • Various technological processes can be integrated   
  • Standard for processing semiconductor wafers

Cluster systems combining modules for processes like co-sputtering, co-evaporation, plasma PCVD, etching or heat treatment

Our cluster concepts

Maximum flexibility in configuring process chambers and general substrate handling make our FHR.Star vacuum processing systems the number-one choice for high-tech R & D applications. Moreover, this type of vacuum processing systems, called as a cluster concept, is considered the standard solution in microelectronics and wafer-type substrates. The choice is yours: We will often already have a proven module solution available for your desired vacuum process and substrate diameter. If not, we will work with you to develop a new configuration that meets your needs.

Combinable process technologies

The following technologies can be implemented into our cluster systems in accordance to the specific requirements of the customers' applications.   

  • Magnetron sputtering   
  • Thermal evaporation   
  • Chemical Vapour Deposition (CVD) / Plasma Enhanced Chemical Vapour Deposition (PECVD)   
  • Atomic Layer Deposition (ALD) 
  • Plasma Etching (PE) / Reactive Ion Etching (RIE)   
  • Heat treatment

A quick look at the advantages for you

The FHR.Star product series provide our customers with high-quality coating machines that combine a wide variety of characteristics and advantages.

  • Maximum flexibility thanks to our modular system concept 
  • Customized configuration according to customer requirements   
  • Effective use of space thanks to the compact design
  • Adjustable target-to-substrate distance   
  • Target changes are quick and easy   
  • Substrates in typical wafer sizes   
  • Fully automatic process control   
  • Attractive investment and operating costs

FHR.Star.100-TetraCo

A co-sputtering system for coating functional films in sensor technology, micro- and optoelectronics

  • Compact design, clean-room integration possible
  • Adjustable target-to-substrate distance
  • Rotating substrate holder

Galery of FHR.Star projects

Contact Sales Star Systems

Manfred Beckers
Sales Engineer

+49 35205 520-256 manfred.beckers[at]fhr.de